Graphene on a Hydrophobic Substrate: Doping Reduction and Hysteresis Suppression under Ambient Conditions

被引：380

作者：

Lafkioti, Myrsini ^{[1
]}

Krauss, Benjamin ^{[1
]}

Lohmann, Timm ^{[1
]}

Zschieschang, Ute ^{[1
]}

Klauk, Hagen ^{[1
]}

v Klitzing, Klaus ^{[1
]}

Smet, Jurgen H. ^{[1
]}

机构：

[1] Max Planck Inst Solid State Res, D-70569 Stuttgart, Germany

来源：

NANO LETTERS | 2010年 / 10卷 / 04期

关键词：

Graphene; transport properties; hydrophobic; self-assembled layer; hexamethyldisilazane; hysteresis; doping; EPITAXIAL GRAPHENE; LARGE-AREA; GAS; TRANSPORT; MOLECULES; LAYERS; PHASE; FILMS;

D O I：

10.1021/nl903162a

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The intrinsic doping level of graphene prepared by mechanical exfoliation and standard lithography procedures on thermally oxidized silicon varies significantly and seems to depend strongly on processing details and the substrate morphology. Moreover, transport properties of such graphene devices suffer from hysteretic behavior under ambient conditions. The hysteresis presumably originates from dipolar adsorbates on the substrate or graphene surface. Here, we demonstrate that it is possible to reliably obtain low intrinsic doping levels and to strongly suppress hysteretic behavior even in ambient air by depositing graphene on top of a thin, hydrophobic self-assembled layer of hexamethyldisilazane (HMDS). The HMDS serves as a reproducible template that prevents the adsorption of dipolar substances. It may also screen the influence of substrate deficiencies.

引用

页码：1149 / 1153

页数：5

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