Neutron reflectivity on nanoporous poly(methylsilsesquioxane) thin films

被引:21
作者
Kim, HC
Volksen, W
Miller, RD
Huang, E
Yang, GY
Briber, RM
Shin, K
Satija, SK
机构
[1] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA
[2] IBM Corp, TJ Watson Res Ctr, Valhalla, NY 10595 USA
[3] Univ Maryland, Dept Mat & Nucl Engn, College Pk, MD 20742 USA
[4] NIST, NCNR, Gaithersburg, MD 20899 USA
关键词
D O I
10.1021/cm0207550
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The depth porosity profile of nanoporous poly(methylsilsesquioxane) thin films was investigated with neutron reflectivity using toluene-d8 or D2O as probes. The nanoporous films show a selective sorption behavior and swell when they are exposed to the selective solvent. The results show a localized higher porosity at the interface between porous films and silicon substrates, which suggests more careful control of the spatial pore distribution is needed to meet the thermo-mechanical stability requirements of porous low-k materials.
引用
收藏
页码:609 / 611
页数:3
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