Highly transparent Ag/SnO2 ohmic contact to p-type GaN for ultraviolet light-emitting diodes

被引:56
作者
Song, JO [1 ]
Seong, TY [1 ]
机构
[1] Gwangju Inst Sci & Technol, Dept Mat Sci & Engn, Kwangju 500712, South Korea
基金
新加坡国家研究基金会;
关键词
D O I
10.1063/1.1834990
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on the formation of highly transparent and low-resistance Ag(3 nm)/Sb-doped SnO2 (ATO) (200 nm) ohmic contacts to p-GaN (5x10(17) cm(-3)). It is shown that the samples become ohmic with a specific contact resistance of 8.7x10(-5) Omega cm(2) upon annealing at 530 degreesC for 1 min in air. The oxidized contacts produce an extremely high light transmittance of 99% at a wavelength of 400 nm. The light-emitting diodes (LEDs) fabricated with the annealed Ag/ATO p-type contact layers give a forward-bias voltage of 3.42 V at injection current of 20 mA, which is better than that of LEDs with the most common oxidized Ni(5 nm)/Au(5 nm) contact layers. Based on scanning electron microscopy and x-ray photoemission spectroscopy results, the ohmic formation mechanisms are discussed. (C) 2004 American Institute of Physics.
引用
收藏
页码:6374 / 6376
页数:3
相关论文
共 23 条
[1]  
[Anonymous], METAL SEMICONDUCTOR
[2]   The dependence of the structure and electronic properties of wurtzite GaN surfaces on the method of preparation [J].
Bermudez, VM ;
Koleske, DD ;
Wickenden, AE .
APPLIED SURFACE SCIENCE, 1998, 126 (1-2) :69-82
[3]   SURFACE SPECTROSCOPIC STUDIES ON PD-DOPED SNO2 [J].
GEIGER, JF ;
SCHIERBAUM, KD ;
GOPEL, W .
VACUUM, 1990, 41 (7-9) :1629-1632
[4]   Low-resistance and high-transparency Ni/indium tin oxide ohmic contacts to p-type GaN [J].
Horng, RH ;
Wuu, DS ;
Lien, YC ;
Lan, WH .
APPLIED PHYSICS LETTERS, 2001, 79 (18) :2925-2927
[5]   Mechanisms for the reduction of the Schottky barrier heights of high-quality nonalloyed Pt contacts on surface-treated p-GaN [J].
Jang, JS ;
Seong, TY .
JOURNAL OF APPLIED PHYSICS, 2000, 88 (05) :3064-3066
[6]   Effect of an indium-tin-oxide overlayer on transparent Ni/Au ohmic contact on p-type GaN [J].
Kim, SY ;
Jang, HW ;
Lee, JL .
APPLIED PHYSICS LETTERS, 2003, 82 (01) :61-63
[7]   Reduction of the Schottky barrier height on silicon carbide using Au nano-particles [J].
Lee, SK ;
Zetterling, CM ;
Östling, M ;
Åberg, I ;
Magnusson, MH ;
Deppert, K ;
Wernersson, LE ;
Samuelson, L ;
Litwin, A .
SOLID-STATE ELECTRONICS, 2002, 46 (09) :1433-1440
[8]   Nitride-based light-emitting diodes with Ni/ITO p-type ohmic contacts [J].
Lin, YC ;
Chang, SJ ;
Su, YK ;
Tsai, TY ;
Chang, CS ;
Shei, SC ;
Hsu, SJ ;
Liu, CH ;
Liaw, UH ;
Chen, SC ;
Huang, BR .
IEEE PHOTONICS TECHNOLOGY LETTERS, 2002, 14 (12) :1668-1670
[9]   Indium tin oxide contacts to gallium nitride optoelectronic devices [J].
Margalith, T ;
Buchinsky, O ;
Cohen, DA ;
Abare, AC ;
Hansen, M ;
DenBaars, SP ;
Coldren, LA .
APPLIED PHYSICS LETTERS, 1999, 74 (26) :3930-3932
[10]   THE EFFECTS OF CONTACT SIZE AND NON-ZERO METAL RESISTANCE ON THE DETERMINATION OF SPECIFIC CONTACT RESISTANCE [J].
MARLOW, GS ;
DAS, MB .
SOLID-STATE ELECTRONICS, 1982, 25 (02) :91-94