Nitride-based light-emitting diodes with Ni/ITO p-type ohmic contacts

被引:76
作者
Lin, YC [1 ]
Chang, SJ
Su, YK
Tsai, TY
Chang, CS
Shei, SC
Hsu, SJ
Liu, CH
Liaw, UH
Chen, SC
Huang, BR
机构
[1] Natl Cheng Kung Univ, Inst Microelect, Tainan 70101, Taiwan
[2] Natl Cheng Kung Univ, Dept Elect Engn, Tainan 70101, Taiwan
[3] S Epitaxy Corp, Hsin Shi 744, Taiwan
[4] Nan Jeon Jr Coll Technol & Commerce, Dept Elect Engn, Yan Hsui 737, Taiwan
[5] Chin Min Coll, Dept Elect Engn, To Fen 351, Taiwan
[6] Natl Yunlin Univ Sci & Technol, Dept Elect Engn, Touliu 640, Taiwan
关键词
GaN; light-emitting diode (LED); Ni-indium tin oxide (ITO); transparent contact;
D O I
10.1109/LPT.2002.804649
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The optical and electrical properties of Ni(5 nm)-Au(5 nm) and Ni(3.5 nm)-indium tin oxide (ITO) (60 nm) films were studied. It was found that the normalized transmittance of Ni/ITO film could reach 87% at 470 nm, which was much larger than that of the Ni-Au film. It was also found that the specific contact resistance was 5 x 10(-4) Omega (.) cm(2) and I x 10(-3) Omega (.) cm(2), respectively, for Ni-Au and Ni/ITO on p-GaN. Furthermore, it was found that the 20 mA output power of light-emitting diode (LED) with Ni-Au p-contact layer was 5.26 mW. In contrast, the output power could reach 6.59 mW for the LED with Ni/ITO p-contact layer.
引用
收藏
页码:1668 / 1670
页数:3
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