Determination of the vibrational, rotational and electron temperatures in N2 and Ar-N2 rf discharge

被引:152
作者
Britun, N.
Gaillard, M.
Ricard, A.
Kim, Y. M.
Kim, K. S.
Han, J. G.
机构
[1] Sungkyunkwan Univ, Ctr Adv Plasma Surface Technol, Suwon 440746, South Korea
[2] Inst Plasma & Adv Mat, Gangwon Do 269802, South Korea
[3] Univ Toulouse 3, Ctr Phys Plasmas & Applicat, F-31062 Toulouse, France
关键词
D O I
10.1088/0022-3727/40/4/016
中图分类号
O59 [应用物理学];
学科分类号
摘要
In order to characterize a nonequilibrium molecular plasma from the point of view of translational, vibrational and rotational degrees of freedom and their interaction, the characteristic temperatures of such a plasma were measured in an ICP rf reactor. Both pure nitrogen and argon-nitrogen mixture plasmas were examined for this purpose. The experimental results of rotational (Tr), vibrational (Tv) and electron (Te) temperatures are presented. Vibrational and rotational temperatures were measured as a function of nitrogen content for both E and H modes of ICP discharge using a power range of 45-200W and pressure range of 2.6-13.3 Pa. Additionally, the pressure dependence of electron temperature in a pure nitrogen discharge was studied. Results show that rotational temperature is approximate to 370K for E mode and approximate to 470K for H mode and almost does not depend on either the applied rf power or the nitrogen content in the discharge. Vibrational temperature groups in the range 5000-12 000K increase with applied rf power and constantly decay with an increase of nitrogen content. The measured values and behaviour of electron temperature are comparable with those for the positive column of the dc glow discharge. The results also prove that these three temperatures obey the classical inequality T-e > T-v > T-r, as well as clarifying the differences in both vibrational and rotational temperature for different modes of the ICP discharge.
引用
收藏
页码:1022 / 1029
页数:8
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