Control and analysis of ion species in N2 inductively coupled plasma with inert gas mixing

被引:24
作者
Bai, KH [1 ]
Lee, DS
Chang, HY
Uhm, HS
机构
[1] Korea Adv Inst Sci & Technol, Dept Phys, Taejon 305701, South Korea
[2] Ajou Univ, Dept Mol Sci & Technol, Suwon 442749, South Korea
关键词
D O I
10.1063/1.1479452
中图分类号
O59 [应用物理学];
学科分类号
摘要
We control the ion density ratio of [N+]/[N-2(+)] and investigate the relation between the ion ratio and the plasma parameters in inductively coupled plasma. We measure the electron energy distribution functions and the ion ratio in a N-2/He,Ar,Xe mixture system as a function of mixing ratio. We can control the ion ratio from 0.002 to 1.4, and the ion ratio is a strong function of electron temperature. We can calculate the ion ratio using a simple model, and the obtained results agree well with the measured values in N-2/He,Ar, but there is a large discrepancy in the N-2/Xe discharge. The non-Maxwellian structure of the electron energy distribution functions may be the reason for the discrepancy. (C) 2002 American Institute of Physics.
引用
收藏
页码:3907 / 3909
页数:3
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