Electron temperature analysis of two-gas-species inductively coupled plasma

被引:30
作者
Bai, KH [1 ]
Chang, HY
Uhm, HS
机构
[1] Korea Adv Inst Sci & Technol, Dept Phys, Taejon 305701, South Korea
[2] Ajou Univ, Dept Mol Sci & Technol, Suwon 442749, South Korea
关键词
D O I
10.1063/1.1404135
中图分类号
O59 [应用物理学];
学科分类号
摘要
The electron energy distribution functions and electron temperatures are measured in Ar/He and Ar/Xe inductively coupled plasma with various mixing ratios. The electron temperature does not change linearly with the mixing ratios; instead it increases abruptly near P-He/PAr+He=1 and decreases rapidly near P-Xe/PAr+Xe=0. A simple model using a two-ion-species fluid model is suggested to explain the electron temperature variations, and it agrees well with the experimental results. (C) 2001 American Institute of Physics.
引用
收藏
页码:1596 / 1598
页数:3
相关论文
共 20 条
[1]   SPATIALLY AVERAGED (GLOBAL) MODEL OF TIME MODULATED HIGH-DENSITY ARGON PLASMAS [J].
ASHIDA, S ;
LEE, C ;
LIEBERMAN, MA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (05) :2498-2507
[2]   AUTOMATIC PLOTTING DEVICE FOR SECOND DERIVATIVE OF LANGMUIR PROBE CURVES [J].
BRANNER, GR ;
FRIAR, EM ;
MEDICUS, G .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1963, 34 (03) :231-&
[3]   EFFECT PLASMA TRANSPORT ON ETCHED PROFILES WITH SURFACE-TOPOGRAPHY IN DIVERGING FIELD ELECTRON-CYCLOTRON-RESONANCE PLASMA [J].
FUJIWARA, N ;
MARUYAMA, T ;
YONEDA, M ;
TSUKAMOTO, K ;
BANJO, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (4B) :2164-2169
[4]   Measurements of electron energy distribution in low-pressure RF discharges [J].
Godyak, V. A. ;
Piejak, R. B. ;
Alexandrovich, B. M. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1992, 1 (01) :36-58
[5]   THE ELECTRON-ENERGY DISTRIBUTION FUNCTION IN A SHIELDED ARGON RADIOFREQUENCY INDUCTIVE DISCHARGE [J].
GODYAK, VA ;
PIEJAK, RB ;
ALEXANDROVICH, BM .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1995, 4 (03) :332-336
[6]   Experimental studies of O2/Ar plasma in a planar inductive discharge [J].
Gudmundsson, JT ;
Kimura, T ;
Lieberman, MA .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1999, 8 (01) :22-30
[7]   Electron temperature control with grid bias in inductively coupled argon plasma [J].
Hong, JI ;
Seo, SH ;
Kim, SS ;
Yoon, NS ;
Chang, CS ;
Chang, HY .
PHYSICS OF PLASMAS, 1999, 6 (03) :1017-1028
[8]   Ionic species in 13.56 MHz discharges in CF4 gas and mixtures of it with Ar and O-2 [J].
Ishikawa, I ;
Sasaki, S ;
Nagaseki, K ;
Saito, Y ;
Suganomata, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (7B) :4648-4650
[9]   Probe measurements and global model of inductively coupled Ar/CF4 discharges [J].
Kimura, T ;
Ohe, K .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1999, 8 (04) :553-560
[10]  
KOBAYASHI H, 1994, JPN J APPL PHYS PT 1, V17, P5979