Pressure and helium mixing effects on plasma parameters in temperature control using a grid system

被引：26

作者：

Bai, KH ^{[1
]}

Hong, JI

Chung, CW

Kim, SS

Chang, HY

机构：

[1] Korea Adv Inst Sci & Technol, Dept Phys, Taejon 305701, South Korea

[2] Samsung Elect, Seoul, South Korea

来源：

PHYSICS OF PLASMAS | 2001年 / 8卷 / 07期

关键词：

D O I：

10.1063/1.1377861

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Pressure and He mixing effects on plasma parameters in electron temperature control using a grid system are investigated. Electron temperature is higher in lower pressure, when the electron temperature is high and not controlled. Electron density can be increased by about three times by decreasing the source gas pressure from 20 to 1 mTorr, and by about two times by He mixing in the temperature controlled region (diffusion region), while the electron density is decreased in the source region. This electron density increase is mainly due to the increase of the high energy electron population, and the measured electron energy distribution functions clearly show this. (C) 2001 American Institute of Physics.

引用

页码：3498 / 3501

页数：4

共 21 条

[1] SPATIALLY AVERAGED (GLOBAL) MODEL OF TIME MODULATED HIGH-DENSITY ARGON PLASMAS [J].

ASHIDA, S ;

LEE, C ;

LIEBERMAN, MA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1995, 13 (05) :2498-2507

[2] ELECTRON-CYCLOTRON RESONANCE MICROWAVE DISCHARGES FOR ETCHING AND THIN-FILM DEPOSITION [J].

ASMUSSEN, J .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1989, 7 (03) :883-893

[3] LARGE VOLUME, HIGH-DENSITY RF INDUCTIVELY COUPLED PLASMA [J].

BOSWELL, RW ;

PORTEOUS, RK .

APPLIED PHYSICS LETTERS, 1987, 50 (17) :1130-1132

[4] AUTOMATIC PLOTTING DEVICE FOR SECOND DERIVATIVE OF LANGMUIR PROBE CURVES [J].

BRANNER, GR ;

FRIAR, EM ;

MEDICUS, G .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1963, 34 (03) :231-&

[5] PLASMA IONIZATION BY HELICON WAVES [J].

CHEN, FF .

PLASMA PHYSICS AND CONTROLLED FUSION, 1991, 33 (04) :339-364

[6] Diagnostics of fluorocarbon radicals in a large-area permanent magnet electron cyclotron resonance etching plasma [J].

Den, S ;

Kuno, T ;

Ito, M ;

Hori, M ;

Goto, T ;

Hayashi, Y ;

Sakamoto, Y .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1996, 35 (12B) :6528-6533

[7]

Godyak VA, 1994, PLASMA SOURCES SCI T, V3

[8] Measurements of electron energy distribution in low-pressure RF discharges [J].

Godyak, V. A. ;

Piejak, R. B. ;

Alexandrovich, B. M. .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 1992, 1 (01) :36-58

[9] ABNORMALLY LOW ELECTRON-ENERGY AND HEATING-MODE TRANSITION IN A LOW-PRESSURE ARGON RF DISCHARGE AT 13.56 MHZ [J].

GODYAK, VA ;

PIEJAK, RB .

PHYSICAL REVIEW LETTERS, 1990, 65 (08) :996-999

[10] Electron temperature control with grid bias in inductively coupled argon plasma [J].

Hong, JI ;

Seo, SH ;

Kim, SS ;

Yoon, NS ;

Chang, CS ;

Chang, HY .

PHYSICS OF PLASMAS, 1999, 6 (03) :1017-1028

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