Pressure and helium mixing effects on plasma parameters in temperature control using a grid system

被引:26
作者
Bai, KH [1 ]
Hong, JI
Chung, CW
Kim, SS
Chang, HY
机构
[1] Korea Adv Inst Sci & Technol, Dept Phys, Taejon 305701, South Korea
[2] Samsung Elect, Seoul, South Korea
关键词
D O I
10.1063/1.1377861
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Pressure and He mixing effects on plasma parameters in electron temperature control using a grid system are investigated. Electron temperature is higher in lower pressure, when the electron temperature is high and not controlled. Electron density can be increased by about three times by decreasing the source gas pressure from 20 to 1 mTorr, and by about two times by He mixing in the temperature controlled region (diffusion region), while the electron density is decreased in the source region. This electron density increase is mainly due to the increase of the high energy electron population, and the measured electron energy distribution functions clearly show this. (C) 2001 American Institute of Physics.
引用
收藏
页码:3498 / 3501
页数:4
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