TIME-MODULATED ELECTRON-CYCLOTRON-RESONANCE PLASMA DISCHARGE FOR CONTROLLING GENERATION OF REACTIVE SPECIES

被引：111

作者：

SAMUKAWA, S ^{[1
]}

FURUOYA, S ^{[1
]}

机构：

[1] NEC CORP LTD,MICROELECTR RES LABS,ULSI RES LAB,SAGAMIHARA,KANAGAWA 229,JAPAN

来源：

APPLIED PHYSICS LETTERS | 1993年 / 63卷 / 15期

关键词：

D O I：

10.1063/1.110586

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

This study examines modulated electron cyclotron resonance (ECR) plasma discharge occurring within a few tens of mus. It can control the generation of reactive species in plasmas. Reactive species are measured by an actinometric optical emission spectroscopy in the pulsed plasma. Good correlation is found between the density ratio of CF2 radicals and F atoms in the CHF3 plasma, and the combination of the pulse duration and pulse intervals. These characteristics are explained by the dependence of reactive species generation in ECR plasma on a time within a few tens of mus. This method provides for controlling the polymerization during SiO2 etching.

引用

页码：2044 / 2046

页数：3

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