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MECHANISMS OF DEPOSITION AND ETCHING OF THIN-FILMS OF PLASMA-POLYMERIZED FLUORINATED MONOMERS IN RADIOFREQUENCY DISCHARGES FED WITH C2F6-H2 AND C2F6-O2 MIXTURES

被引：128
作者：
DAGOSTINO, R
CRAMAROSSA, F
ILLUZZI, F
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1987年 / 61卷 / 08期
关键词：
D O I：
10.1063/1.337864
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：2754 / 2762
页数：9
相关论文
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