POLYMER FILM FORMATION IN C2F6-H2 DISCHARGES

[1] Adamson A. W., 1982, PHYSICAL CHEM SURFAC

[2] AREFI F, 1983, 6TH P INT S PLASM CH, P565

[3] METAL DOPED FLUOROCARBON POLYMER-FILMS PREPARED BY PLASMA POLYMERIZATION USING AN RF PLANAR MAGNETRON TARGET [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 212 (1-3): : 497 - 503

[4] EFFECT OF ARGON ADDITION TO SICL4-H2 MIXTURES ON THE OPTICAL-PROPERTIES OF GLOW-DISCHARGE SILICON FILMS [J]. THIN SOLID FILMS, 1985, 129 (3-4) : 217 - 226

[5] CLARK DT, 1978, HDB XRAY ULTRAVIOLET, pCH6

[6] d'Agostino R., 1984, Plasma Chemistry and Plasma Processing, V4, P21, DOI 10.1007/BF00567369

[7] d'Agostino R., 1983, XVI International Conference on Phenomena in Ionized Gases (Invited Papers), P251

[8] d'Agostino R., 1984, Plasma Chemistry and Plasma Processing, V4, P1, DOI 10.1007/BF00567367

[9] MECHANISMS OF ETCHING AND POLYMERIZATION IN RADIOFREQUENCY DISCHARGES OF CF4-H2,CF4-C2F4,C2F6-H2,C3F8-H2 [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (03) : 1284 - 1288

[10] dAgostino R., 1982, PLASMA CHEM PLASMA P, V2, P213

[1] Adamson A. W., 1982, PHYSICAL CHEM SURFAC

[2] AREFI F, 1983, 6TH P INT S PLASM CH, P565

[3] METAL DOPED FLUOROCARBON POLYMER-FILMS PREPARED BY PLASMA POLYMERIZATION USING AN RF PLANAR MAGNETRON TARGET [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 212 (1-3): : 497 - 503

[4] EFFECT OF ARGON ADDITION TO SICL4-H2 MIXTURES ON THE OPTICAL-PROPERTIES OF GLOW-DISCHARGE SILICON FILMS [J]. THIN SOLID FILMS, 1985, 129 (3-4) : 217 - 226

[5] CLARK DT, 1978, HDB XRAY ULTRAVIOLET, pCH6

[6] d'Agostino R., 1984, Plasma Chemistry and Plasma Processing, V4, P21, DOI 10.1007/BF00567369

[7] d'Agostino R., 1983, XVI International Conference on Phenomena in Ionized Gases (Invited Papers), P251

[8] d'Agostino R., 1984, Plasma Chemistry and Plasma Processing, V4, P1, DOI 10.1007/BF00567367

[9] MECHANISMS OF ETCHING AND POLYMERIZATION IN RADIOFREQUENCY DISCHARGES OF CF4-H2,CF4-C2F4,C2F6-H2,C3F8-H2 [J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (03) : 1284 - 1288

[10] dAgostino R., 1982, PLASMA CHEM PLASMA P, V2, P213