Synthesis and characterization of mesoporous silica thin films as a catalyst support on a titanium substrate

被引:24
作者
Glazneva, T. S.
Rebrov, E. V.
Schouten, J. C.
Paukshtis, E. A.
Ismagilov, Z. R.
机构
[1] Boreskov Inst Catalysis, Novosibirsk 630090, Russia
[2] Eindhoven Univ Technol, NL-5600 MB Eindhoven, Netherlands
基金
俄罗斯基础研究基金会;
关键词
mesoporous silica; evaporation-induced self-assembly (EISA); DRIFT spectroscopy;
D O I
10.1016/j.tsf.2006.11.058
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Mesoporous silica films with a thickness of 500-900 nm were synthesized on a titanium substrate by the evaporation-induced self-assembly method (with 900-1200 rpm for 90 s) using cetyltrimethylammonium bromide (CTAB) as structure-directing agent and tetraethyl orthosilicate as the silica source. Prior to coating deposition, the titanium substrate was oxidized to increase the surface roughness up to 500 mn and to produce a thin titania layer. Just before the synthesis, the titania layer was made super hydrophilic by an UV treatment for 2 h to provide a better adhesion of the silica film to the substrate. Films with hexagonal and cubic mesostructures with a uniform pore size of 2.8 mm and a surface area of 1080 m(2)/g were obtained and characterized by different methods. An alternative approach for surfactant removal by gradual heating up to 250 degrees C in vacuum was applied. Complete removal of CTAB from the as-synthesized silica films was confirmed by infrared spectroscopy. (C) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:6391 / 6394
页数:4
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