AG:CD and CD:AG implantations into high purity silica

被引:16
作者
Anderson, TS
Magruder, RH
Kinser, DL
Wittig, JE
Zuhr, RA
Thomas, DK
机构
[1] Vanderbilt Univ, Dept Appl & Engn Sci, Nashville, TN 37235 USA
[2] Oak Ridge Natl Lab, Div Solid State, Oak Ridge, TN 37831 USA
关键词
D O I
10.1016/S0022-3093(97)00469-9
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Silica composites containing nanometer dimension colloids were fabricated by implantation of Ag ions followed by Cd ions, and by implantation of Cd ions followed by Ag ions. These samples were characterized using transmission electron microscopy and optical spectroscopy. Doses used for the sequential implantations were 6 x 10(16) ions/cm(2) of Ag and Cd in a 1 to 1 ratio. Single element colloids were also fabricated by implantation of Ag or Cd using the same nominal dose and implantation energy as the sequential implantations. Sequential implantation of Ag and Cd leads to the formation of multi-component metal nanoclusters and elemental nanoclusters. Different microstructures were obtained depending on the order of implantation. Optical responses are consistent with results expected from effective medium theory. (C) 1998 Elsevier Science B.V.
引用
收藏
页码:299 / 306
页数:8
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