SIMPLE CRITERION ON COLLOID FORMATION IN SIO2 GLASSES BY ION-IMPLANTATION

被引：67

作者：

HOSONO, H

机构：

[1] Research Laboratory of Engineering Materials, Tokyo Institute of Technology, Midori-ku, Yokohama, 227

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 9A期

关键词：

ION IMPLANTATION; SIO2; GLASS; COLLOID FORMATION; NANOCOMPOSITE;

D O I：

10.1143/JJAP.32.3892

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A simple criterion as a first approximation to predict the formation of elementary colloids of implants in SiO2 glasses by ion implantation has been proposed. The criterion predicts that colloid formation occurs when free energy of formation of oxides of implants is greater than that of SiO2 at approximately 3000 K, which corresponds to the fictive temperature of implanted layers. The prediction is compared with observations reported so far.

引用

页码：3892 / 3894

页数：3

共 29 条

[1] NEAR-SURFACE NUCLEATION AND CRYSTALLIZATION OF AN ION-IMPLANTED LITHIA-ALUMINA-SILICA GLASS
ARNOLD, GW
[J]. JOURNAL OF APPLIED PHYSICS, 1975, 46 (10) : 4466 - 4473
[2] CHARACTERIZATION OF THE NEAR-SURFACE REGION OF GLASS IMPLANTED WITH LIGHT-ELEMENTS
ARNOLD, GW
BROW, RK
MYERS, DR
[J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1990, 120 (1-3) : 234 - 240
[3] ARNOLD GW, 1977, J APPL PHYS, V48, P488
[4] PRECIPITATION OF GROUP-V ELEMENTS AND GE IN SIO2 AND THEIR DRIFT IN A TEMPERATURE-GRADIENT
CELLER, GK
TRIMBLE, LE
SHENG, TT
KOSINSKI, SG
WEST, KW
[J]. APPLIED PHYSICS LETTERS, 1988, 53 (13) : 1178 - 1180
[5] FUKUMI K, 1991, JPN J APPL PHYS, V30, P744
[6] RAMAN STUDIES OF VITREOUS SIO2 VERSUS FICTIVE TEMPERATURE
GEISSBERGER, AE
GALEENER, FL
[J]. PHYSICAL REVIEW B, 1983, 28 (06): : 3266 - 3271
[7] LARGE 3RD-ORDER OPTICAL NONLINEARITY OF NANOMETER-SIZED AMORPHOUS-SEMICONDUCTOR - PHOSPHORUS COLLOIDS FORMED IN SIO2 GLASS BY ION-IMPLANTATION
HOSONO, H
ABE, Y
LEE, YL
TOKIZAKI, T
NAKAMURA, A
[J]. APPLIED PHYSICS LETTERS, 1992, 61 (23) : 2747 - 2749
[8] CROSS-SECTIONAL TEM OBSERVATION OF COPPER-IMPLANTED SIO2 GLASS
HOSONO, H
FUKUSHIMA, H
ABE, Y
WEEKS, RA
ZUHR, RA
[J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1992, 143 (2-3) : 157 - 161
[9] EFFECTS OF COIMPLANTATION OF SILICON AND NITROGEN ON STRUCTURAL DEFECTS AND SI-N BOND FORMATION IN SILICA GLASS
HOSONO, H
ABE, Y
OYOSHI, K
TANAKA, S
[J]. PHYSICAL REVIEW B, 1991, 43 (14): : 11966 - 11970
[10] COALESCENCE OF NANOSIZED COPPER COLLOID PARTICLES FORMED IN CU-IMPLANTED SIO2 GLASS BY IMPLANTATION OF FLUORINE IONS - FORMATION OF VIOLET COPPER COLLOIDS
HOSONO, H
ABE, Y
MATSUNAMI, N
[J]. APPLIED PHYSICS LETTERS, 1992, 60 (21) : 2613 - 2615

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