Ga self-diffusion in GaAs isotope heterostructures

被引:59
作者
Wang, L
Hsu, L
Haller, EE
Erickson, JW
Fischer, A
Eberl, K
Cardona, M
机构
[1] UNIV CALIF BERKELEY, LAWRENCE BERKELEY LAB, BERKELEY, CA 94720 USA
[2] CHARLES EVANS & ASSOCIATES, REDWOOD CITY, CA 94063 USA
[3] MAX PLANCK INST FESTKORPERFORSCH, D-70569 STUTTGART, GERMANY
关键词
D O I
10.1103/PhysRevLett.76.2342
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Isotopically controlled GaAs heterostructures have been used to study Ga self-diffusion with secondary-ion mass spectrometry. This approach probes a close to ideal random walk problem, free from perturbations such as electric fields, mechanical stresses, or chemical potentials. The Ga self-diffusion coefficient in intrinsic GaAs can be well described with D = (43 +/- 25) exp[(-4.24 +/- 0.06 eV)/k(B)T] over 6 orders of magnitude between 800 and 1225 degrees C under As-rich condition. No significant doping effects are observed in samples with their substrates doped with Te up to 4 x 10(17) cm(-3) or Zn up to 1 x 10(19) cm(-3). Our results substantiate some of the findings in recent theoretical work.
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页码:2342 / 2345
页数:4
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