The influence of Mg doping on the materials properties of Ba1-xSrxTiO3 thin films for tunable device applications

被引:242
作者
Cole, MW [1 ]
Joshi, PC
Ervin, MH
Wood, MC
Pfeffer, RL
机构
[1] USA, Res Lab, Weapons & Mat Res Directorate, Aberdeen Proving Ground, MD 21005 USA
[2] Rutgers State Univ, Dept Phys, Piscataway, NJ 08854 USA
关键词
dilectric properties; deposition process; film miscrostructure;
D O I
10.1016/S0040-6090(00)01059-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have investigated the structural, microstructural, interfacial, and surface morphological properties of Ba0.60Sr0.40TiO3 thin films Mg doped from 0 to 20 mol%. A strong correlation was observed between the films materials properties and the prior determined dielectric and insulating characteristics as a function of Mg doping. Non-textured polycrystalline films with a dense microstructure and abrupt film-Pt electrode interface were obtained after annealing at 750 degreesC for 30 min. Single phase solid solution films were achieved at Mg doping levels up to 5 mol%, while multiphased films were obtained for Mg doping levels of 20 mol%. Decreases in the films dielectric constant, dielectric loss, tunability and leakage current characteristics were paralleled by a reduction in grain size as a function of increasing Mg dopant concentration. Our results suggest that Mg doping serves to limit grain growth and is thereby responsible for lowering the dielectric constant from 450 to 205. It is suggested that Mg behaves as an acceptor-type dopant at the grain boundary and is responsible for the doped films low dielectric loss and good leakage current characteristics. Examination of the performance-property trade-offs advocates the 5-mol% Mg doped BST film to be an excellent choice for tunable microwave device applications. (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:34 / 41
页数:8
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