Radio-frequency reactively sputtered VOx thin films deposited at different oxygen flows

被引:23
作者
Lourenco, A [1 ]
Gorenstein, A
Passerini, S
Smyrl, WH
Fantini, MCA
Tabacniks, MH
机构
[1] UNICAMP, IFGW, DFA, BR-13084970 Campinas, SP, Brazil
[2] Univ Minnesota, Corros Res Ctr, Minneapolis, MN 55455 USA
[3] USP, Inst Fis, BR-05389970 Sao Paulo, Brazil
关键词
D O I
10.1149/1.1838327
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The effect of different oxygen flow rate on the properties of vanadium oxide thin films formed by radio-frequency, reactive sputtering deposition are investigated. The stoichiometry of the as-deposited films was investigated by Rutherford backscattering spectrometry. For high oxygen flows films were mainly V2O5, while a lower oxide was obtained at the lowest flow. Forward recoil spectrometry indicated a significant hydrogen content in the thin films. X-ray diffraction showed that the films were amorphous. The electrochromism shown by such films upon lithium intercalation was also studied. Samples deposited at high oxygen flow were transparent/yellow, and showed a somewhat complicated electrochromic behavior. Upon lithium insertion up to 25 mC/cm(2), the films acted as cathodically coloring materials at wavelengths higher than 500 nm and as anodically coloring material at lower wavelengths. For the higher insertion levels, the opposite behavior was observed. Samples deposited at very low O-2, flows showed no electrochromic behavior.
引用
收藏
页码:706 / 711
页数:6
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