Diamond Chemical Vapor Deposition: Emerging technology for tooling applications

被引:23
作者
Trava-Airoldi, VJ
Corat, EJ
Baranauskas, V
机构
[1] INPE, Lab Associado Sensores & Mat, BR-12201907 Sao Jose Dos Campos, SP, Brazil
[2] Univ Estadual Campinas, Fac Elect Engn, Dept Semicond & Foton, BR-13083970 Campinas, SP, Brazil
来源
ADVANCED CERAMIC TOOLS FOR MACHINING APPLICATION - III | 1998年 / 138-1卷
关键词
CVD diamond; diamond cutting; free-standing diamond; diamond growth; halogen; CF4; superhard tool; hardness; fracture toughness; WC-Co; tool insert; adhesion strength; tool life time; diamond burr;
D O I
10.4028/www.scientific.net/KEM.138-140.195
中图分类号
T [工业技术];
学科分类号
08 [工学];
摘要
This chapter is about the new technology of Chemical Vapor Deposition (CVD) of diamond films. The ability to deposit thin diamond coatings on several substrate materials and, also, the growth of free-standing diamond pieces opened a wide panorama of applications, including the area of superhard tools. We present a brief but comprehensive review of the science and technology of CVD diamond, with focus on the use of halogen precursors in the gas phase. The new growth method of Surface Wave Assisted CVD is reviewed among the other conventional ones. The problem of film adherence on WC-Co tool inserts is considered and the good perspectives to obtain a tough diamond tool is shown. Free-standing diamond tools are also presented with particular attention to the CVD diamond burrs for dentistry applications.
引用
收藏
页码:195 / 244
页数:50
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