Optical properties of hafnium oxide thin films and their application in energy-efficient windows

被引:185
作者
Al-Kuhaili, MF [1 ]
机构
[1] King Fahd Univ Petr & Minerals, Dept Phys, Dhahran 31261, Saudi Arabia
关键词
D O I
10.1016/j.optmat.2004.04.014
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Thin films of hafnium oxide were deposited by electron beam evaporation. The films were characterized using X-ray diffraction, X-ray photoelectron spectroscopy and normal incidence transmittance. The films were amorphous, stoichiometric, and transparent down to a wavelength of 300nm. The optical properties of the films, including the refractive index, the absorption index and the bandgap, were deter-mined. The refractive index, in the visible, was relatively high (1.89). The direct bandgap was found to be 5.41 eV. Absorption was insignificant for wavelengths above 250 nm. A heat mirror was built based on the hafnium oxide/silver/hafnium oxide/glass system. This heat mirror was found to be transparent in the visible with an average transmittance of 72.4%, and reflective in the near infrared (wavelength = 700-2000nm) with an average reflectance of 67.0%. Such a heat mirror can be used in applications involving energy-efficient windows. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:383 / 387
页数:5
相关论文
共 20 条
[1]   Effects of preparation conditions on the optical properties of thin films of tellurium oxide [J].
Al-Kuhaili, MF ;
Durrani, SMA ;
Khawaja, EE ;
Shirokoff, J .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2002, 35 (09) :910-915
[2]  
BALOG M, 1977, THIN SOLID FILMS, V41, P247, DOI 10.1016/0040-6090(77)90312-1
[3]   OPTICAL ENERGY GAPS IN MONOCLINIC OXIDES OF HAFNIUM AND ZIRCONIUM AND THEIR SOLID SOLUTIONS [J].
BENDORAI.JG ;
SALOMON, RE .
JOURNAL OF PHYSICAL CHEMISTRY, 1965, 69 (10) :3666-&
[4]   Physical characterization of hafnium oxide thin films and their application as gas sensing devices [J].
Capone, S ;
Leo, G ;
Rella, R ;
Siciliano, P ;
Vasanelli, L ;
Alvisi, M ;
Mirenghi, L ;
Rizzo, A .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (06) :3564-3568
[5]   Spectroscopic ellipsometry characterization of high-k dielectric HfO2 thin films and the high-temperature annealing effects on their optical properties [J].
Cho, YJ ;
Nguyen, NV ;
Richter, CA ;
Ehrstein, JR ;
Lee, BH ;
Lee, JC .
APPLIED PHYSICS LETTERS, 2002, 80 (07) :1249-1251
[6]   REACTIVE EVAPORATION OF LOW-DEFECT DENSITY HAFNIA [J].
CHOW, R ;
FALABELLA, S ;
LOOMIS, GE ;
RAINER, F ;
STOLZ, CJ ;
KOZLOWSKI, MR .
APPLIED OPTICS, 1993, 32 (28) :5567-5574
[7]   Dielectric/Ag/dielectric coated energy-efficient glass windows for warm climates [J].
Durrani, SMA ;
Khawaja, EE ;
Al-Shukri, AM ;
Al-Kuhaili, MF .
ENERGY AND BUILDINGS, 2004, 36 (09) :891-898
[8]   OPTICAL-PROPERTIES AND ENVIRONMENTAL STABILITY OF OXIDE COATINGS DEPOSITED BY REACTIVE SPUTTERING [J].
EDLOU, SM ;
SMAJKIEWICZ, A ;
ALJUMAILY, GA .
APPLIED OPTICS, 1993, 32 (28) :5601-5605
[9]   RADIATIVE HEATING AND COOLING WITH SPECTRALLY SELECTIVE SURFACES [J].
GRANQVIST, CG .
APPLIED OPTICS, 1981, 20 (15) :2606-2615
[10]   OPTICAL CONSTANTS OF NOBLE METALS [J].
JOHNSON, PB ;
CHRISTY, RW .
PHYSICAL REVIEW B, 1972, 6 (12) :4370-4379