High uniformity deposition with chemical beams in high vacuum

被引：24

作者：

Benvenuti, G ^{[1
]}

Halary-Wagner, E ^{[1
]}

Brioude, A ^{[1
]}

Hoffmann, P ^{[1
]}

机构：

[1] Ecole Polytech Fed Lausanne, Inst Imagerie & Opt Appl, CH-1015 Lausanne, Switzerland

来源：

THIN SOLID FILMS | 2003年 / 427卷 / 1-2期

关键词：

light assisted deposition; molecular beams; uniform thickness; large area deposition; compact reactor;

D O I：

10.1016/S0040-6090(02)01190-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

A mathematical model is applied to build a compact reactor for uniform thickness deposition in the molecular beam regime. The injector system uses a gas source and is compatible with perpendicular light illumination of the substrate for patterned deposition (etching). Titanium dioxide deposition is achieved and experimental results are compared to the mathematical model. Thickness uniformity better than 2% is experimentally achieved on a 150-mm diameter substrate and is compared to the 1 % calculated. This approach allows a compact reactor design and an easy up grading in deposition area size and illumination optics design for light assisted processes. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：411 / 416

页数：6

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