FLUX DISTRIBUTIONS IN LOW-PRESSURE DEPOSITION AND ETCH MODELS

被引：28

作者：

CALE, TS ^{[1
]}

机构：

[1] ARIZONA STATE UNIV,CTR SOLID STATE PHYS,TEMPE,AZ 85287

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1991年 / 9卷 / 05期

关键词：

D O I：

10.1116/1.585691

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2551 / 2553

页数：3

共 9 条

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