A STUDY ON RADICAL FLUXES IN SILANE PLASMA CVD FROM TRENCH COVERAGE ANALYSIS

被引：65

作者：

YUUKI, A ^{[1
]}

MATSUI, Y ^{[1
]}

TACHIBANA, K ^{[1
]}

机构：

[1] KYOTO INST TECHNOL,DEPT ELECTR,SAKYO KU,KYOTO 606,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1989年 / 28卷 / 02期

关键词：

D O I：

10.1143/JJAP.28.212

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：212 / 218

页数：7

共 26 条

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