ON THE BALANCE BETWEEN SILYLENE AND SILYL RADICALS IN RF GLOW-DISCHARGES IN SILANE - THE EFFECT ON DEPOSITION RATES OF A-SI-H

被引：53

作者：

KUSHNER, MJ

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 07期

关键词：

D O I：

10.1063/1.339411

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2803 / 2811

页数：9

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