ON THE DECOMPOSITION OF SILANE IN PLASMA DEPOSITION REACTORS

被引：28

作者：

DEJOSEPH, CA

HAALAND, PD

GARSCADDEN, A

机构：

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 1986年 / 14卷 / 02期

关键词：

D O I：

10.1109/TPS.1986.4316519

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

引用

页码：165 / 172

页数：8

共 21 条

[1] REACTIONS OF HE+, NE+, AND AR+ WITH CH4, C2H6, SIH4, AND SI2H6 [J].

CHATHAM, H ;

HILS, D ;

ROBERTSON, R ;

GALLAGHER, AC .

JOURNAL OF CHEMICAL PHYSICS, 1983, 79 (03) :1301-1311

[2] ION CHEMISTRY IN SILANE DC DISCHARGES [J].

CHATHAM, H ;

GALLAGHER, A .

JOURNAL OF APPLIED PHYSICS, 1985, 58 (01) :159-169

[3] ELECTRON-IMPACT SPECTROSCOPY OF SILANE AND GERMANE [J].

DILLON, MA ;

WANG, RG ;

WANG, ZW ;

SPENCE, D .

JOURNAL OF CHEMICAL PHYSICS, 1985, 82 (07) :2909-2917

[4]

EBINGHAUS H, 1964, Z NATURFORSCH PT A, VA 19, P732

[5] ELECTRON KINETICS OF SILANE DISCHARGES [J].

GARSCADDEN, A ;

DUKE, GL ;

BAILEY, WF .

APPLIED PHYSICS LETTERS, 1983, 43 (11) :1012-1014

[6]

GARSCADDEN A, 1981, PROGR ASTRONAUTICS A, V74, P1125

[7]

HAALAND P, 1984, 37TH P GAS EL C BOUL, P40

[8]

HALLER I, 1983, 6TH P INT C PLASM CH, P826

[9] The far ultraviolet spectra of methylsilanes [J].

Harada, Y. ;

Murrell, J. N. ;

Sheena, H. H. .

CHEMICAL PHYSICS LETTERS, 1968, 1 (12) :595-596

[10]

HAYASHI M, 1984, 4TH DRY PROC S TOK

← 1 2 3 →