Determination of gas temperature and thermometric species in inductively coupled plasmas by emission and diode laser absorption

被引:34
作者
Bol'shakov, AA [1 ]
Cruden, BA [1 ]
Sharma, SP [1 ]
机构
[1] NASA, Ames Res Ctr, Moffett Field, CA 94035 USA
关键词
D O I
10.1088/0963-0252/13/4/019
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
A vertical cavity surface-emitting laser diode (VCSEL) was used as a spectrally tunable emission source for measurements of the radial-integrated gas temperature inside an inductively coupled plasma reactor. The data were obtained by profiling the Doppler-broadened absorption of metastable Ar atoms at 763.51 nm in argon and argon/nitrogen plasmas (3%, 45%, and 90% N-2 in Ar) at pressures of 0.5-70 Pa and inductive powers of 100 and 300 W. The results were compared to the rotational temperature derived from the N-2 emission at the (0,0) vibrational transition of the C(3)Pi(u)-B(3)Pi(g) system. The differences in integrated rotational and Doppler temperatures were attributed to non-uniform spatial distributions of both temperature and thermometric species (Ar* and N-2*) that varied depending on the conditions. A two-dimensional, three-temperature fluid plasma simulation was employed to explain these differences. This work should facilitate further development of a miniature sensor for non-intrusive acquisition of data (temperature and densities of multiple plasma species) during micro- and nano-fabrication plasma processing, thus enabling diagnostic-assisted continuous optimization and advanced control over the processes. Such sensors would also enable us to track the origins and pathways of damaging contaminants, thereby providing real-time feedback for adjustment of processes. Our work serves as an example of how two line-of-sight integrated temperatures derived from different thermometric species make it possible to characterize the radial non-uniformity of the plasma.
引用
收藏
页码:691 / 700
页数:10
相关论文
共 54 条
[1]   HIGH-DENSITY PLASMA MODE OF AN INDUCTIVELY COUPLED RADIO-FREQUENCY DISCHARGE [J].
AMORIM, J ;
MACIEL, HS ;
SUDANO, JP .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (02) :362-365
[2]   Evaporation rate and composition monitoring of electron beam physical vapor deposition processes [J].
Anklam, TM ;
Berzins, LV ;
Braun, DG ;
Haynam, C ;
Meier, T ;
McClelland, MA .
SURFACE & COATINGS TECHNOLOGY, 1995, 76-77 (1-3) :681-686
[3]  
[Anonymous], 2013, PLASMA KINETICS ATMO
[4]   Spatial distributions of absolute densities of argon metastable state 3p54s in a Gaseous Electronics Conference Reference Cell [J].
Augustyniak, E ;
Filimonov, S ;
Borysow, J .
JOURNAL OF APPLIED PHYSICS, 1999, 86 (09) :4767-4771
[5]   SEMICONDUCTOR-LASER ABSORPTION DIAGNOSTICS OF ATOMIC OXYGEN IN AN ATMOSPHERIC-PRESSURE PLASMA [J].
BAER, DS ;
CHANG, HA ;
HANSON, RK .
JOURNAL OF QUANTITATIVE SPECTROSCOPY & RADIATIVE TRANSFER, 1993, 50 (06) :621-633
[6]   TUNABLE DIODE-LASER ABSORPTION DIAGNOSTICS FOR ATMOSPHERIC-PRESSURE PLASMAS [J].
BAER, DS ;
HANSON, RK .
JOURNAL OF QUANTITATIVE SPECTROSCOPY & RADIATIVE TRANSFER, 1992, 47 (06) :455-475
[7]  
BARANOV IY, 1981, OPT SPEKTROSK+, V51, P571
[8]   Time-resolved plasma diagnostic by laser-diode spectroscopy [J].
Beverini, N ;
DelGobbo, G ;
Genovesi, GL ;
Maccarrone, F ;
Strumia, F ;
Paganucci, F ;
Turco, A ;
Andrenucci, M .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1996, 32 (11) :1874-1881
[9]  
BOCHKOVA OP, 1971, OPT SPECTROSC-USSR, V31, P359
[10]  
BOCHKOVA OP, 1971, OPT SPEKTROSK, V31, P677