Photoluminescence from Si1-xGex alloy nanocrystals

被引:105
作者
Takeoka, S
Toshikiyo, K
Fujii, M [1 ]
Hayashi, S
Yamamoto, K
机构
[1] Kobe Univ, Fac Engn, Dept Elect & Elect Engn, Kobe, Hyogo 6578501, Japan
[2] Kobe Univ, Grad Sch Sci & Technol, Div Math & Mat Sci, Kobe, Hyogo 6578501, Japan
关键词
D O I
10.1103/PhysRevB.61.15988
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Photoluminescence (PL) from Si1-xGex alloy nanocrystals (nc-Si1-xGex) as small as 4-5 nm in diameter was studied as a function of the Ge content. The nc-Si1-xGex samples were fabricated by the cosputtering of Si, Ge, and SiO2 and postannealing at 1100 degrees C. High-resolution transmission electron microscopy, electron diffraction, and Raman spectroscopy clearly showed the growth of spherical Si1-xGex nanocrystals in SiO2 matrices. The PL spectra of nc-Si1-xGex were found to be very sensitive to the Ge content. A low-energy shift of the PL peak from the widened band gap of Si nanocrystals to that of Ge nanocrystals with increasing Cre content was clearly observed.
引用
收藏
页码:15988 / 15992
页数:5
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