Dimensional metrology system of shape and scale in pattern transfer

被引：6

作者：

McIntosh, JM ^{[1
]}

Kane, B ^{[1
]}

Houge, E ^{[1
]}

Vartuli, C ^{[1
]}

Mei, X ^{[1
]}

机构：

[1] Lucent Technol, Orlando, FL USA

来源：

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIV | 2000年 / 3998卷

关键词：

MPC; multiple parameter characterization; pattern transfer; correlation; shape; scale; profile; feedforward;

D O I：

10.1117/12.386473

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：206 / 217

页数：12

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