Photoemission study of pristine and photodegraded poly(methyl methacrylate)

被引：36

作者：

Okudaira, KK ^{[1
]}

Hasegawa, S

Sprunger, PT

Morikawa, E

Saile, V

Seki, K

Harada, Y

Ueno, N

机构：

[1] Louisiana State Univ, J Bennett Johnston Sr Ctr Adv Microstruct & Devic, Baton Rouge, LA 70803 USA

[2] Nagoya Univ, Grad Sch Sci, Dept Chem, Nagoya, Aichi 46401, Japan

[3] Chiba Univ, Fac Engn, Chiba 263, Japan

[4] Inst Mol Sci, Okazaki, Aichi 444, Japan

来源：

JOURNAL OF APPLIED PHYSICS | 1998年 / 83卷 / 08期

关键词：

D O I：

10.1063/1.367188

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Degradation of poly(methyl methacrylate) (PMMA) thin films by vacuum ultraviolet (VUV) monochromatic synchrotron radiation was investigated by ultraviolet photoelectron spectroscopy. The photodegradation reaction was analyzed, for the first time, by different spectrometry techniques and ab initio molecular orbital calculations. It is concluded that the main degradation mechanism in PMMA by VUV photons is ascribed to the disappearance of ester groups and formation of double bonds in the polymer chain. The final product of the degradation seems to possess a relatively rich conjugation of unsaturated bonds. The rate constant of the degradation by VUV photons is evaluated to be 2.4 x 10(-17) photons(-1) cm(2). (C) 1998 American Institute of Physics.

引用

页码：4292 / 4298

页数：7

共 30 条

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