PLASMA-POLYMERIZED DRY-DEVELOPABLE RESIST FOR SYNCHROTRON RADIATION LITHOGRAPHY

被引：7

作者：

HORI, M ^{[1
]}

YAMADA, H ^{[1
]}

YONEDA, T ^{[1
]}

MORITA, S ^{[1
]}

HATTORI, S ^{[1
]}

机构：

[1] MEIJO UNIV,DEPT ELECT ENGN,TENPAKU KU,NAGOYA,AICHI 468,JAPAN

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1987年 / 134卷 / 03期

关键词：

D O I：

10.1149/1.2100536

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：707 / 711

页数：5

共 11 条

[1]

FAY B, 1976, APPL PHYS LETT, V29, P390

[2] A BREAKTHROUGH TO THE PLASMA DEPOSITED DRY-DEVELOPABLE E-BEAM RESIST [J].

HATTORI, S ;

MORITA, S ;

YAMADA, M ;

TAMANO, J ;

IEDA, M .

POLYMER ENGINEERING AND SCIENCE, 1983, 23 (18) :1043-1046

[3] RADIATION-CHEMISTRY OF POLY(METHACRYLATES) [J].

HIRAOKA, H .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1977, 21 (02) :121-130

[4]

HIRAOKA H, 1985, 12TH INT C PHOT TOK

[5]

Hori M., 1984, Plasma Chemistry and Plasma Processing, V4, P119, DOI 10.1007/BF00647192

[6]

HORI M, IN PRESS J VAC SCI T

[7]

ICHIMURA S, 1981, J VAC SCI TECHNOL B, V1, P1076

[8] X-RAY REPLICATION OF MASKS BY SYNCHROTRON RADIATION OF INS-ES [J].

NISHIMURA, T ;

KOTANI, H ;

MATSUI, S ;

NAKAGAWA, O ;

ARITOME, H ;

NAMBA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS, 1978, 17 :13-17

[9]

SHEN M, 1976, PLASMA CHEM POLYM

[10] APPLICATION OF SYNCHROTRON RADIATION TO X-RAY LITHOGRAPHY [J].

SPILLER, E ;

EASTMAN, DE ;

FEDER, R ;

GROBMAN, WD ;

GUDAT, W ;

TOPALIAN, J .

JOURNAL OF APPLIED PHYSICS, 1976, 47 (12) :5450-5459

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