A BREAKTHROUGH TO THE PLASMA DEPOSITED DRY-DEVELOPABLE E-BEAM RESIST

被引：11

作者：

HATTORI, S

MORITA, S

YAMADA, M

TAMANO, J

IEDA, M

机构：

来源：

POLYMER ENGINEERING AND SCIENCE | 1983年 / 23卷 / 18期

关键词：

D O I：

10.1002/pen.760231813

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

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页码：1043 / 1046

页数：4

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