ELECTRON-BEAM VACUUM LITHOGRAPHY USING A PLASMA CO-POLYMERIZED MMA TMT RESIST

被引：27

作者：

YAMADA, M ^{[1
]}

TAMANO, J ^{[1
]}

YONEDA, K ^{[1
]}

MORITA, S ^{[1
]}

HATTORI, S ^{[1
]}

机构：

[1] MEIJO UNIV,DEPT ELECT ENGN,TENPAKU KU,NAGOYA,AICHI 468,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1982年 / 21卷 / 05期

关键词：

D O I：

10.1143/JJAP.21.768

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：768 / 771

页数：4

共 12 条

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