VACUUM LITHOGRAPHY USING PLASMA POLYMERIZATION AND PLASMA DEVELOPMENT

被引：14

作者：

HATTORI, S ^{[1
]}

TAMANO, J ^{[1
]}

YAMADA, M ^{[1
]}

IEDA, M ^{[1
]}

MORITA, S ^{[1
]}

YONEDA, K ^{[1
]}

ISHIBASHI, S ^{[1
]}

机构：

[1] MEIJO UNIV,DEPT ELECT ENGN,TEMPAKU KU,NAGOYA,AICHI 468,JAPAN

来源：

关键词：

D O I：

10.1016/0040-6090(81)90665-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：189 / 194

页数：6

共 10 条

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[2] HUGHES H, 1979, 8TH P TECHN C PHOT P, P207
[3] PLASMA POLYMERIZED METHYL-METHACRYLATE AS AN ELECTRON-BEAM RESIST
MORITA, S
TAMANO, J
HATTORI, S
IEDA, M
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (07) : 3938 - 3941
[4] MORITA S, 1980, JUN P 80 2 MICR S PL, V26, P10
[5] Nakane H., 1981, Oyo Buturi, V50, P145
[6] SUGANO T, 1980, HANDOTAI PLASMA PROC
[7] TAMANO J, PLASMA CHEM PLASMA P
[8] NEW FAMILY OF POSITIVE ELECTRON-BEAM RESISTS-POLY(OLEFIN SULFONES)
THOMPSON, LF
BOWDEN, MJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (12) : 1722 - 1726
[9] Vossen J.L., 1978, THIN FILM PROCESSES
[10] YAMADA M, 1980, 2ND P S DRY PROC, P79