Strong extreme ultraviolet emission from a double-stream xenon/helium gas puff target irradiated with a Nd:YAG laser

被引：100

作者：

Fiedorowicz, H

Bartnik, A

Daido, H

Choi, IW

Suzuki, M

Yamagami, S

机构：

[1] Mil Univ Technol, Inst Optoelect, PL-00908 Warsaw, Poland

[2] Osaka Univ, Inst Laser Engn, Suita, Osaka 5650871, Japan

来源：

OPTICS COMMUNICATIONS | 2000年 / 184卷 / 1-4期

关键词：

laser applications; laser-produced plasma; gas puff target; lithography;

D O I：

10.1016/S0030-4018(00)00946-9

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Extreme ultraviolet (EUV) emission in the 8-18 nm wavelength range from a new double-stream gas puff target irradiated with a Nd:YAG laser has been studied for the first time. The target was formed by pulsed injection of a xenon gas stream into a hollow gas stream from helium by using a double-nozzle setup. Strong EW production near 11 nm from the double-stream xenon/helium target exceeding emissions from iron, copper, and tin solid targets was observed. This new result may be useful to design a laser-produced radiation source for EUV lithography. (C) 2000 Published by Elsevier Science B.V.

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收藏

页码：161 / 167

页数：7

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