Artificially layered heteropolytypic structures based on SiC polytypes: molecular beam epitaxy, characterization and properties

被引:163
作者
Fissel, A [1 ]
机构
[1] Leibniz Univ Hannover, Abt Halbleitertechnol, Informat Technol Lab, D-30167 Hannover, Germany
来源
PHYSICS REPORTS-REVIEW SECTION OF PHYSICS LETTERS | 2003年 / 379卷 / 3-4期
关键词
molecular beam epitaxy; semiconductors; heterostructures silicon carbide;
D O I
10.1016/S0370-1573(02)00632-4
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
In recent years, new types of semiconductor heterostructures consisting of only one material in different crystal structures, such as wurtzite/zinc-blende heterostructures (heteropolytypic structures) are under discussion. Such heterostructures maintain a completely defect-free, lattice matched, and coherent interface and effects due to different chemical constituents can be avoided. In this field, silicon carbide (SiC) is the most promising candidate because SiC crystallizes in more than two different stable structures. The preparation of heteropolytypic structures by only a change of the crystal structure during the growth is a great challenge and is realized only under well-defined conditions of molecular beam epitaxy (MBE). In this paper an overview is given of the results and conclusions of recent material research on the MBE growth, characterization and properties of SiC heteropolytypic structures and related materials. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:149 / 255
页数:107
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