Measurement and control of absolute nitrogen atom density in an electron-beam-excited plasma using vacuum ultraviolet absorption spectroscopy

被引:54
作者
Tada, S
Takashima, S
Ito, M
Hori, M
Goto, T
Sakamoto, Y
机构
[1] Nagoya Univ, Dept Quantum Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan
[2] Nichimen Elect Technol Corp, Kagawa, Saitama 3501155, Japan
关键词
D O I
10.1063/1.1305559
中图分类号
O59 [应用物理学];
学科分类号
摘要
The absolute nitrogen (N) atom density in an electron-beam-excited plasma (EBEP) operating at an ultralow pressure has been investigated by vacuum ultraviolet absorption spectroscopy, employing a microdischarge hollow-cathode lamp. The measured N atom density was estimated to be around 6x10(11) cm(-3), and the dissociation fraction was 4.9% at a N-2 pressure of 0.05 Pa, an electron-beam current of 10 A, and an electron-beam acceleration voltage of 120 V. The EBEP potentially enables us to control the electron density and electron energy independently with the electron-beam current and electron-beam acceleration voltages, respectively. It was found that N atom densities increased with increasing electron-beam current and electron acceleration voltage under low-pressure conditions. The EBEP shows great promise as a N atom source operating at an ultralow pressure. (C) 2000 American Institute of Physics. [S0021-8979(00)01616-9].
引用
收藏
页码:1756 / 1759
页数:4
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