Atomic force microscopy investigation of the growth of different alkylsiloxane monolayers from highly concentrated solutions

被引:24
作者
Foisner, J
Glaser, A
Kattner, J
Hoffmann, H
Friedbacher, G
机构
[1] Tech Univ Vienna, Inst Chem Technol & Analyt, A-1060 Vienna, Austria
[2] Tech Univ Vienna, Inst Appl Synthet Chem, A-1060 Vienna, Austria
关键词
D O I
10.1021/la026646h
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
The growth of self-assembled monolayers of alkylsiloxanes on silicon surfaces through adsorption of alkyltrichlorosilanes at various concentrations in toluene has been investigated. The influence of high alkylsilane concentrations up to 50 mmol/L on the ordering of the films has been studied. Characterization of the films has been performed with tapping mode atomic force microscopy and ellipsometry. Different alkylsilanes have been used in order to study both the effect of the chain length and the age of the precursor solution on the ordering of the molecules in solution as well as on the substrate surface. For freshly prepared solutions with a high concentration of octadecyltrichlorosilane (OTS, C-18), irregular rough films with a maximum surface coverage of 70% have been observed. For C-10, C-12, and C-16 alkylsilanes, comparatively flat films have been obtained under the same conditions. For OTS, such flat films can only be achieved after prolonged aging of the precursor solution. The results are discussed in terms of ordering depending on different experimental parameters.
引用
收藏
页码:3741 / 3746
页数:6
相关论文
共 24 条
[21]   Formation of self-assembled octadecylsiloxane monolayers on mica and silicon surfaces studied by atomic force microscopy and infrared spectroscopy [J].
Vallant, T ;
Brunner, H ;
Mayer, U ;
Hoffmann, H ;
Leitner, T ;
Resch, R ;
Friedbacher, G .
JOURNAL OF PHYSICAL CHEMISTRY B, 1998, 102 (37) :7190-7197
[22]   Investigation of the formation and structure of self-assembled alkylsiloxane monolayers on silicon using in situ attenuated total reflection infrared spectroscopy [J].
Vallant, T ;
Kattner, J ;
Brunner, H ;
Mayer, U ;
Hoffmann, H .
LANGMUIR, 1999, 15 (16) :5339-5346
[23]   THE STRUCTURE OF SELF-ASSEMBLED MONOLAYERS OF ALKYLSILOXANES ON SILICON - A COMPARISON OF RESULTS FROM ELLIPSOMETRY AND LOW-ANGLE X-RAY REFLECTIVITY [J].
WASSERMAN, SR ;
WHITESIDES, GM ;
TIDSWELL, IM ;
OCKO, BM ;
PERSHAN, PS ;
AXE, JD .
JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1989, 111 (15) :5852-5861
[24]   Kinetics of self-assembled monolayer growth explored via submonolayer coverage of incomplete films [J].
Woodward, JT ;
Doudevski, I ;
Sikes, HD ;
Schwartz, DK .
JOURNAL OF PHYSICAL CHEMISTRY B, 1997, 101 (38) :7535-7541