Study of ZrO2-Y2O3 films prepared by rf magnetron reactive sputtering

被引:47
作者
Gao, PT [1 ]
Meng, LJ
dos Santos, MP
Teixeira, V
Andritschky, M
机构
[1] Univ Minho, Dept Fis, P-4710 Braga, Portugal
[2] Inst Super Engn Porto, Dept Fis, P-4200 Oporto, Portugal
关键词
ZrO2; Y2O3; thin films; reactive sputtering;
D O I
10.1016/S0040-6090(00)01395-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
ZrO2-Y2O3 films with different Y2O3 concentrations have been prepared by rf magnetron reactive sputtering. The films have been characterised by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive X-ray (EDX), Raman spectroscopy and optical spectroscopy. The influence of Y2O3 concentration on the microstructure and the optical properties have been discussed. Both tetragonal and cubic symmetries with a preferred orientation along (200)(c,t) plane are found. The crystallite size increases with the increasing of Y2O3 concentration. It can be found that the refractive index and the extinction coefficient decrease with increasing of Y2O3 concentration. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:32 / 36
页数:5
相关论文
共 22 条
[1]   RESIDUAL-STRESS IN PROTECTIVE ZRO2 COATINGS PRODUCED BY MAGNETRON SPUTTERING [J].
ANDRITSCHKY, M ;
TEIXEIRA, V .
VACUUM, 1994, 45 (10-11) :1047-1050
[2]  
[Anonymous], 1983, OPTICAL PROPERTIES G
[3]   In situ reflection high energy electron bombardment analysis of biaxially oriented yttria-stabilized zirconia thin film growth on amorphous substrates [J].
Betz, V ;
Holzapfel, B ;
Schultz, L .
THIN SOLID FILMS, 1997, 301 (1-2) :28-34
[4]   Influence of substrate temperature and target composition on the properties of yttria-stabilized zirconia thin films grown by rf reactive magnetron sputtering [J].
Boulouz, M ;
Boulouz, A ;
Giani, A ;
Boyer, A .
THIN SOLID FILMS, 1998, 323 (1-2) :85-92
[5]   Metal-organic vapor deposition of YSZ electrolyte layers for solid oxide fuel cell applications [J].
Chour, KW ;
Chen, J ;
Xu, R .
THIN SOLID FILMS, 1997, 304 (1-2) :106-112
[6]  
Cullity BD, 1978, ELEMENTS XRAY DIFFRA
[7]   CONTROL OF Y2O3-STABILIZED ZRO2 THIN-FILM ORIENTATION BY MODIFIED BIAS SPUTTERING [J].
FUKUTOMI, M ;
AOKI, S ;
KOMORI, K ;
TANAKA, Y ;
ASANO, T ;
MAEDA, H .
THIN SOLID FILMS, 1994, 239 (01) :123-126
[8]   VACUUM EVAPORATED FILMS OF ALUMINUM FLUORIDE [J].
HEITMANN, W .
THIN SOLID FILMS, 1970, 5 (01) :61-&
[9]  
JONES F, 1988, J VAC SCI TECHNOL A, V6, P3258
[10]  
KIM ET, 1993, THIN SOLID FILMS, V277, P7