CONTROL OF Y2O3-STABILIZED ZRO2 THIN-FILM ORIENTATION BY MODIFIED BIAS SPUTTERING

被引：12

作者：

FUKUTOMI, M

AOKI, S

KOMORI, K

TANAKA, Y

ASANO, T

MAEDA, H

机构：

[1] National Research Institute for Metals, Tsukuba Laboratories, Tsukuba-shi, Ibaraki, 305

来源：

THIN SOLID FILMS | 1994年 / 239卷 / 01期

关键词：

D O I：

10.1016/0040-6090(94)90118-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

An attempt was made to control the crystal orientation of yttria-stabilized zirconia (YSZ) thin films using a modified bias sputtering technique. Two specially devised electrodes installed in a sputtering system were found to play an important role in obtaining films with a high degree of preferred orientation. An argon ion flux extracted from the discharge space formed by these electrodes appeared to impinge on the growing film to form films with this strong preferred orientation. The pole figure obtained by texture analysis revealed the clear evidence for alignment of the in-plane crystal axes of YSZ buffer layers for the growth of YBa2Cu3Oy onto polycrystalline metal substrates. An apparent in-plane texturing was also confirmed in subsequently laser-deposited YBa2Cu3Oy films. As a result, the current-carrying capacity of YBa2Cu3Oy films was markedly improved.

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收藏

页码：123 / 126

页数：4

相关论文

共 11 条

[1] ORIENTATION DEPENDENCE OF GRAIN-BOUNDARY CRITICAL CURRENTS IN YBA2CU3O7-DELTA BICRYSTALS [J].

DIMOS, D ;

CHAUDHARI, P ;

MANNHART, J ;

LEGOUES, FK .

PHYSICAL REVIEW LETTERS, 1988, 61 (02) :219-222

[2] PREPARATION AND SUBSTRATE REACTIONS OF SUPERCONDUCTING Y-BA-CU-O FILMS [J].

GURVITCH, M ;

FIORY, AT .

APPLIED PHYSICS LETTERS, 1987, 51 (13) :1027-1029

[3] INPLANE ALIGNED YBA2CU3O7-X THIN-FILMS DEPOSITED ON POLYCRYSTALLINE METALLIC SUBSTRATES [J].

IIJIMA, Y ;

TANABE, N ;

KOHNO, O ;

IKENO, Y .

APPLIED PHYSICS LETTERS, 1992, 60 (06) :769-771

[4] MODIFICATION OF ZIRCONIA FILM PROPERTIES BY LOW-ENERGY ION-BOMBARDMENT DURING REACTIVE ION-BEAM DEPOSITION [J].

KAO, AS ;

GORMAN, GL .

JOURNAL OF APPLIED PHYSICS, 1990, 67 (08) :3826-3834

[5] STRUCTURAL-CHANGES INDUCED BY HEATING IN ELECTROLESS NICKEL PHOSPHORUS ALLOYS [J].

MAI, QX ;

DANIELS, RD ;

HARPALANI, HB .

THIN SOLID FILMS, 1988, 166 (1-2) :235-247

[6] SIO2 PLANARIZATION BY 2-STEP RF BIAS-SPUTTERING [J].

MOGAMI, T ;

MORIMOTO, M ;

OKABAYASHI, H ;

NAGASAWA, E .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1985, 3 (03) :857-861

[7] PHYSICAL AND ELECTRICAL-PROPERTIES OF YTTRIA-STABILIZED ZIRCONIA EPITAXIAL THIN-FILMS DEPOSITED BY ION-BEAM SPUTTERING ON SILICON [J].

PELLET, C ;

SCHWEBEL, C ;

HESTO, P .

THIN SOLID FILMS, 1989, 175 :23-28

[8] LASER DEPOSITION OF BIAXIALLY TEXTURED YTTRIA-STABILIZED ZIRCONIA BUFFER LAYERS ON POLYCRYSTALLINE METALLIC ALLOYS FOR HIGH CRITICAL CURRENT Y-BA-CU-O THIN-FILMS [J].

READE, RP ;

BERDAHL, P ;

RUSSO, RE ;

GARRISON, SM .

APPLIED PHYSICS LETTERS, 1992, 61 (18) :2231-2233

[9] PREPARATION OF YBA2CU3OY SUPERCONDUCTING THIN-FILMS ON METALLIC SUBSTRATES BY EXCIMER LASER ABLATION [J].

SAITOH, J ;

FUKUTOMI, M ;

KOMORI, K ;

TANAKA, Y ;

ASANO, T ;

MAEDA, H ;

TAKAHARA, H .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1991, 30 (5B) :L898-L900

[10] DEPOSITION AND PROPERTIES OF YTTRIA-STABILIZED ZIRCONIA THIN-FILMS USING REACTIVE DIRECT-CURRENT MAGNETRON SPUTTERING [J].

THIELE, ES ;

WANG, LS ;

MASON, TO ;

BARNETT, SA .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1991, 9 (06) :3054-3060