Visible-blind GaN Schottky barrier detectors grown on Si(111)

被引:132
作者
Osinsky, A
Gangopadhyay, S
Yang, JW
Gaska, R
Kuksenkov, D
Temkin, H
Shmagin, IK
Chang, YC
Muth, JF
Kolbas, RM
机构
[1] APA Opt Inc, Blaine, MN 55449 USA
[2] Texas Tech Univ, Dept Elect Engn, Lubbock, TX 79409 USA
[3] N Carolina State Univ, Dept Elect & Comp Engn, Raleigh, NC 27695 USA
关键词
D O I
10.1063/1.120755
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report novel GaN detectors grown by molecular beam epitaxy on Si(111) substrates. Wurtzite structure epitaxial GaN exhibits room-temperature photoluminescence with a band-edge-related emission width as narrow as 7 nm and intensities comparable to high quality layers grown on sapphire by metalorganic chemical vapor deposition. Spectral response of lateral geometry Schottky detectors shows a sharp cutoff at 365 nm with peak responsivities of approximate-to 0.05 A/W at 0V, and approximate-to 0.1 A/W with a -4V bias. The dark current is approximate-to 60 nA at -2V bias. the noise equivalent power is estimated to be 3.7x10(-9)W over the responsible bandwidth of 2.2 MHz.
引用
收藏
页码:551 / 553
页数:3
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