NdBa2Cu3O7-δ thin films deposited by stoichiometric target sputtering

被引：11

作者：

Hakuraku, Y ^{[1
]}

Miyata, S ^{[1
]}

Inoue, T ^{[1
]}

Nozoe, S ^{[1
]}

机构：

[1] Kagoshima Univ, Fac Engn, Kagoshima 890, Japan

来源：

SUPERCONDUCTOR SCIENCE & TECHNOLOGY | 1998年 / 11卷 / 02期

关键词：

D O I：

10.1088/0953-2048/11/2/002

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Thin films of NdBa2Cu3O7-delta (NBCO) were fabricated on MgO (100) substrates by do magnetron sputtering. The critical parameters for the deposition of the superconducting NBCO thin films were studied. The properties of films strongly depended on the substrate temperature and sputtering gas pressures. The x-ray diffraction pattern showed that the sputter-deposited thin films were highly c-axis oriented. Thin films with T-czero = 88.5 K could be obtained reproducibly under the optimized sputtering conditions. This film also showed a critical current density of about 8 x 10(5) A Cm-2 at 77 K.

引用

页码：179 / 182

页数：4

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