A quantitative study of the nano-scratch behavior of boron and carbon nitride films

The nano-scratch tests of amorphous boron and carbon nitride films prepared by r.f. magnetron sputtering onto c-Si (0 0 1) substrates, at room temperature, were performed by a Nano Indenter XP system with a lateral-force measuring attachment. The films' hardness and elastic modulus were determined by nanoindentation employing continuous stiffness measurements. Low load (2-20 mN) scratch tests were used to evaluate the scratch resistance and the friction coefficient of the films. The scratch process was analyzed into two regimes, that is fully elastic recovery and plastic deformation of the films, depending on the increase of the ramping load and the maximum normal load applied during test. A load dependent transition was found in both the scratch and friction responses. A mixed elastic-plastic behavior was identified for both the BN, and CN, films, with the elastic deformation to be dominant. No delamination of the films tested in this work was observed supporting their potentiality in applications where both wear resistance and elasticity are required. (C) 2002 Elsevier Science B.V. All rights reserved.