E-beam mask repair: Fundamental capability and applications

被引：14

作者：

Liang, T ^{[1
]}

Frendberg, E ^{[1
]}

Bald, D ^{[1
]}

Penn, M ^{[1
]}

Stivers, A ^{[1
]}

机构：

[1] Intel Corp, Santa Clara, CA 95054 USA

来源：

24TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PT 1 AND 2 | 2004年 / 5567卷

关键词：

mask repair; electron beam etch and deposition; electron beam mask repair; quartz etch; EUV mask;

D O I：

10.1117/12.569210

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have installed the industry's first commercial electron beam mask repair tool in Intel's mask shop. In this paper we describe our on-going efforts of developing e-beam repair processes for binary, phase-shifting and EUVL masks. We present a complete characterization of fundamental capabilities of e-beam repair and make general comparisons with other technologies, in terms of repair resolutions, substrate damage, edge placement, removal selectivity, and process margin. Among many applications, results from quartz etch with excellent resolution and vertical profile are described.

引用

页码：456 / 466

页数：11

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