Properties of nanostructured GaN prepared by different methods

被引:6
作者
Kam, KC
Deepak, FL
Gundiah, G
Rao, CNR [1 ]
Cheetham, AK
机构
[1] Univ Calif Santa Barbara, Mat Res Lab, Santa Barbara, CA 93106 USA
[2] Jawaharlal Nehru Ctr Adv Sci Res, Chem & Phys Mat Unit, Bangalore 560064, Karnataka, India
[3] Jawaharlal Nehru Ctr Adv Sci Res, CSIR, Ctr Excellence Chem, Bangalore 560064, Karnataka, India
关键词
D O I
10.1016/j.solidstatesciences.2004.06.008
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
Various methods have been employed to prepare nanostructured GaN exhibiting reasonable surface areas. The methods include ammonolysis of gamma-Ga2O3 or Ga2O3 prepared in the presence of a surfactant, and the reaction of a mixture of Ga2O3 and Ga(acac)(3) with NH3. The latter reaction was also carried out in the presence of H3BO3. All the methods yield good GaN samples as characterized by X-ray diffraction, electron microscopy and photoluminescence measurements. Relatively high surface areas were obtained with the GaN samples prepared by the ammonolysis of gamma-Ga2O3 (53 m(2) g(-1)), and of Ga2O3 prepared in the presence of a surfactant (66 m(2) g(-1)). GaN obtained by the reaction of NH3 with a mixture of Ga2O3, Ga(acac)(3) and boric acid gave a surface area of 59 m(2) g(-1). GaN nanoparticles prepared by the nitridation of mesoporous Ga2O3 samples generally retain some porosity. (C) 2004 Elsevier SAS. All rights reserved.
引用
收藏
页码:1107 / 1112
页数:8
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