Temperature-dependent La- and Al-induced dipole behavior monitored by femtosecond pump/probe photoelectron spectroscopy

被引:24
作者
Arimura, Hiroaki [1 ]
Haight, Richard [2 ]
Brown, Stephen L. [2 ]
Kellock, Andrew [3 ]
Callegari, Alessandro [2 ]
Copel, Matthew [2 ]
Watanabe, Heiji [1 ]
Narayanan, Vijay [2 ]
Ando, Takashi [1 ,2 ]
机构
[1] Osaka Univ, Grad Sch Engn, Suita, Osaka 5650871, Japan
[2] IBM Corp, TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA
[3] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA
关键词
aluminium compounds; annealing; dielectric materials; high-speed optical techniques; lanthanum compounds; photoelectron spectra; silicon compounds;
D O I
10.1063/1.3374883
中图分类号
O59 [应用物理学];
学科分类号
摘要
The impact of thermal budget on La- and Al-induced dipoles is systematically investigated by femtosecond pump/probe photoelectron spectroscopy. We find that the La-induced dipole requires annealing at 300 degrees C for complete activation, whereas the Al-induced dipole is activated at the lower temperature but requires annealing at 300 degrees C to eliminate a counteracting sheet charge. When La and Al atoms coexist on a SiO2 surface, the La-induced dipole becomes dominative after a silicate-forming reaction at the temperature above 600 degrees C. This phenomenon is attributed to the different natures of the La- and Al-induced dipoles, i.e., long-range and short-range.
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页数:3
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