Threshold voltage shift in organic field effect transistors by dipole monolayers on the gate insulator

被引:503
作者
Pernstich, KP [1 ]
Haas, S
Oberhoff, D
Goldmann, C
Gundlach, DJ
Batlogg, B
Rashid, AN
Schitter, G
机构
[1] ETH, Solid State Phys Lab, CH-8093 Zurich, Switzerland
[2] ETH, Inst Quantum Elect, CH-8093 Zurich, Switzerland
[3] ETH, Nanotechnol Grp, CH-8093 Zurich, Switzerland
关键词
D O I
10.1063/1.1810205
中图分类号
O59 [应用物理学];
学科分类号
摘要
We demonstrate controllable shift of the threshold voltage and the turn-on voltage in pentacene thin film transistors and rubrene single crystal field effect transistors (FET) by the use of nine organosilanes with different functional groups. Prior to depositing the organic semiconductors, the organosilanes were applied to the SiO2 gate insulator from solution and form a self-assembled monolayer (SAM). The observed shifts of the transfer characteristics range from -2 to 50 V and can be related to the surface potential of the layer next to the transistor channel. Concomitantly the mobile charge carrier concentration at zero gate bias reaches up to 4x10(12)/cm(2). In the single crystal FETs the measured transfer characteristics are also shifted, while essentially maintaining the high quality of the subthreshold swing. The shift of the transfer characteristics is governed by the built-in electric field of the SAM and can be explained using a simple energy level diagram. In the thin film devices, the subthreshold region is broadened, indicating that the SAM creates additional trap states, whose density is estimated to be of order 1x10(12)/cm(2). (C) 2004 American Institute of Physics.
引用
收藏
页码:6431 / 6438
页数:8
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