An improved method to strip aluminum from porous anodic alumina films

被引：76

作者：

Xu, TT ^{[1
]}

Piner, RD ^{[1
]}

Ruoff, RS ^{[1
]}

机构：

[1] Northwestern Univ, Dept Mech Engn, Evanston, IL 60208 USA

来源：

LANGMUIR | 2003年 / 19卷 / 04期

关键词：

D O I：

10.1021/la0264724

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

The use of nail polish as the protective layer during the fabrication of PAA films is reported. As such, the ingredients of nail polish are similar to those of the protective layer Masuda used. It is found that nail polish remains intact during processing to complete the nanopore film, the film is residue-free following its removal, it is easy to handle, and it is inexpensive.

引用

页码：1443 / 1445

页数：3

共 19 条

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