Room temperature coulomb oscillation of a single electron switch with an electrically formed quantum dot and its modeling

被引:19
作者
Kim, DH [1 ]
Lee, JD
Park, BG
机构
[1] Seoul Natl Univ, Nanoelect Inst, Kwanak Gu, Seoul 151742, South Korea
[2] Seoul Natl Univ, Inter Univ Semicond Res Ctr, Kwanak Gu, Seoul 151742, South Korea
[3] Seoul Natl Univ, Sch Elect Engn, Kwanak Gu, Seoul 151742, South Korea
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 2000年 / 39卷 / 4B期
关键词
single electron switch; quantum dot; polysilicon; reoxidation; sidewall; room temperature Coulomb oscillation; independently controllable tunnel junctions; macro modeling;
D O I
10.1143/JJAP.39.2329
中图分类号
O59 [应用物理学];
学科分类号
摘要
The room temperature operation of a single electron switch fabricated by conventional Si large-scale integration (LSI) technologies has been demonstrated. The quantum dot formed by the electric field effect of a dual gate structure was miniaturized to a smaller size than the state-of-the-art feature size, using the controllable process technologies such as polysilicon reoxidation and polysilicon sidewall formation. Electrical measurement showed a room temperature Coulomb oscillation and a movement of the oscillation peak in two independently controllable tunnel junctions. Based on the device physics, the modified macro modeling of fabricated single electron switches was performed. Existing concept of single electron transistor (SET) macro modeling was first applied to the experimental result, and the circuit performance of the fabricated device was effectively predicted using this modeling scheme.
引用
收藏
页码:2329 / 2333
页数:5
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