Mass density of polystyrene thin films measured by twin neutron reflectivity

被引:76
作者
Wallace, WE
Tan, NCB
Wu, WL
Satija, S
机构
[1] NIST, Div Polymers, Gaithersburg, MD 20899 USA
[2] NIST, Ctr Neutron Res, Gaithersburg, MD 20899 USA
关键词
D O I
10.1063/1.475769
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Neutron reflectivity measurements on polystyrene thin films (6.5-79.0 nm thick) supported on silicon substrates indicate that the mass density is near the bulk value regardless of film thickness. To account for possible inaccuracies arising from sample misalignment, reflectivity measurements were made both from the free-surface and silicon-substrate sides of the thin film, a method termed twin reflectivity. For films spin coated on the hydrogen-terminated silicon surface the relative uncertainty in the density measurement was on the order of 1%, but for films spin coated onto the silicon native-oxide surface the analysis was more difficult because of subtleties in data fitting due to the oxide layer. Nevertheless, within the limits of greater uncertainty, these films also showed no systematic change in density with thickness. (C) 1998 American Institute of Physics.
引用
收藏
页码:3798 / 3804
页数:7
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