Enhanced oxidation and segregation in plasma source ion implanted alloy

被引：3

作者：

Bolduc, M ^{[1
]}

Terreault, B ^{[1
]}

机构：

[1] Univ Quebec, INRS EMT, Varennes, PQ J3X 1S2, Canada

来源：

APPLIED PHYSICS LETTERS | 2003年 / 82卷 / 06期

关键词：

D O I：

10.1063/1.1544432

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Segregation of surprising magnitude and depth was discovered in oxygen plasma-implanted Mg-containing Al alloys. In order to identify the respective roles of diffusional kinetics and oxidation energetics in the effect, pure Al and an Al-Mg-Zn-Cu-Cr alloy were implanted for various times, or oxidized in air, at 700 K. Examination of depth profiles and chemical states of O, Al, and Mg by x-ray photoelectron spectroscopy reveals a potent synergy between the chemical potential drive and the radiation-enhanced diffusion. (C) 2003 American Institute of Physics.

引用

页码：895 / 897

页数：3

共 15 条

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